界面粗糙度对氧化层残余应力分布的影响  

Effects of Interface Roughness on Distribution of Residual Stress in Thermally-growth Oxide Layer

作　　者：郑伟[1] 李平[1] 王银坤[1] 

机构地区：[1]中国民航飞行学院航空工程学院,四川广汉618307

出　　处：《热加工工艺》2013年第10期152-153,156,共3页Hot Working Technology

基　　金：中国民航飞行学院研究生创新项目(X2010-26)

摘　　要：根据热障涂层中陶瓷层和粘结层界面间的氧化层界面形貌和界面粗糙情况,建立了具有氧化层的热障涂层平面应变模型,模拟计算了氧化层界面残余应力分布,分析了粗糙度对氧化层残余应力分布的影响。计算结果表明,随粗糙度的增加,氧化层中的X和Y方向应力值均不断增加,沿着波形下降的趋势应力逐渐增大,波谷处应力最大,且X方向的应力值远大于Y的方向应力值。According to the interface topography and roughness of the thermally-growth oxide layer between the top coating and the bond coating, the plane strain model of thermal barrier coating with thermally-growth oxide layer was established, the distribution of the residual stress in thermally-growth oxide layer was calculated, the effects of roughness on the distribution of the residual stress were analyzed. The calculating results show that with the increase of the roughness of the oxide layer, X and Y direction stress values increase and along the waveform downward trend, the stress increases gradually, the stress is the largest and X stress is larger than Y stress at the valley of the wave.

关 键 词：热障涂层 氧化层 残余应力 粗糙度 

分 类 号：TG148[一般工业技术—材料科学与工程]