全自动单晶圆铝腐蚀清洗机工艺原理与工作过程介绍  

Introduction to the Process and the Operating of the Automatic Single Wafer Aluminum Corrosion and Cleaning Equipment

作　　者：宋文超[1] 陈仲武[1] 姚立新[1] 张利军[1] 王刚[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2013年第6期1-4,31,共5页Equipment for Electronic Products Manufacturing

摘　　要：介绍了几种常用的晶圆金属铝膜腐蚀工艺,并详细讲解了全自动单晶圆铝腐蚀清洗机采用第四种工艺配方进行金属铝膜腐蚀清洗的工艺过程。同时,简单介绍了为提高腐蚀清洗效果而设计的两套子系统的工作原理。Several aluminum corrosion processes are introduced. With one of the processes, the operating of the automatic aluminum corrosion and cleaning equipment is present.. The principle of temperature control system and acid recycle system is also introduced.

关 键 词：半导体 铝腐蚀 单晶圆清洗 自动设备 

分 类 号：TN305.97[电子电信—物理电子学]