CMP抛光液供给及分布系统的研究  

Study on the CMP Slurry Supply and Distribution System

作　　者：周国安[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2013年第6期9-12,20,共5页Equipment for Electronic Products Manufacturing

摘　　要：从整体结构及硬件设计方面介绍了小批量生产及隔膜泵系统,分析隔膜泵的工作原理,循环机理及硬件控制和驱动电路,同时指出在湿度较大的生产厂里面产生的漂移及解决措施;从整体结构分析集中式抛光液供给系统,分析其抛光液混合中心具备的温度控制、无轴承磁悬浮泵工作机理及循环机制;对比隔膜泵与无轴承磁悬浮泵对颗粒凝聚的影响,并分析这种系统适用范围。The paper introduces the small quantity throughput production and diaphragm pump system from the overall structure and the hardware design, to analysis the working principle,circulation mechanism,hardware control and drive circuit of the diaphragm pump, pointing out causing the current drift in the humidity factory and the method how to fix it; To analysis the centralized slurry supply system from the overall structure, and to analysis its mixing center which include temperature control,bearingless magnetically levitated centrifugal pump and its circulating mechanism; Compare with the diaphragm pump and the bearingless magnetically levitated centrifugal pump on particle aggregation, and analysis of the both systems applicable situation and condition.

关 键 词：化学机械平坦化 隔膜泵 蠕动泵 无轴承磁悬浮泵 抛光液 

分 类 号：TN305.2[电子电信—物理电子学]