中阶梯光栅刻划误差要求分析  

Analysis of the Ruling Error Requirements for Echelle Grating

作　　者：丁卫涛[1] 黄元申[1] 张大伟[1] 杨海马[1] 

机构地区：[1]上海市现代光学系统重点实验室,教育部光学仪器与系统工程中心,上海理工大学光电信息与计算机工程学院

出　　处：《光电工程》2013年第9期68-75,共8页Opto-Electronic Engineering

基　　金：国家自然科学基金(61176085;11105149);国家科技支撑计划(2011BAF02804);国家重大科学仪器设备开发专项(2011YQ15004004);上海市教委曙光项目(11SG44);上海市超精密光学加工与检测服务平台建设(11DZ2290301);上海市重点学科建设项目(S30502);高等学校博士学科点专项科研基金(2012312013000)

摘　　要：中阶梯光栅作为高色散和高分辨率光学器件,已经广泛的应用于大型光谱仪器之中。在中阶梯光栅的刻划过程中,存在刻划误差,这将严重影响光栅衍射性能,最终使得衍射效果产生缺陷。针对此情况,定量分析了中阶梯光栅的刻划误差对衍射光谱、衍射级次、波前误差、鬼线强度、杂散光强度的影响以及提出了一种从衍射效率角度分析刻划误差的方法。在满足一定条件下,求得上述因素对应的刻划误差分别为:1 265.8 nm、352 nm、37 nm、112 nm、3.4 nm。这对光栅刻划时限定刻划机的刻划精度提供了直接和重要的参考。Echelle grating is used extensively in spectral instruments owing to its advantages, such as the advanced intrinsic dispersion and resolving power. But while ruling the echelle grating, there may be some periodic components of spacing errors which will seriously affect the performance of grating diffraction and lead to defects of the diffraction effects. In response to this situation, the effect of grating＇s line error on diffraction spectrum, diffraction order, wavefront error, the intensity of the rowland ghost line and the intensity of stray light was proposed. What＇s more, a method for analyzing the grating＇s line error from the aspect of the diffraction efficiency was proposed. Under certain conditions, the ruling errors for meeting every kind of requests are l 265.8 nm, 352 nm, 37 nm, 112 nm, 3.4 nm respectively, which provides a direct and important reference fbr the ruling accuracy before ruling an echelle grating.

关 键 词：刻划误差 误差分析 中阶梯光栅 衍射效率 

分 类 号：O439[机械工程—光学工程]