pH值对碱性抛光液速率稳定性的影响  

Effects of the pH Value on the Stability of the Alkaline Slurry Rate

作　　者：曹哲[1] 刘玉岭[1] 王辰伟[1] 李海龙[1] 蔡婷[1] 

机构地区：[1]河北工业大学微电子研究所,天津300130

出　　处：《微纳电子技术》2013年第9期599-602,共4页Micronanoelectronic Technology

基　　金：国家中长期发展规划重大科技专项资助项目(2009ZX02308)

摘　　要：通过分析pH值对碱性抛光液抛光速率稳定性的影响,得出了碱性抛光液抛光速率相对稳定的pH值区间,并与酸性抛光液进行了对比,在酸性环境中至少稳定24 h,pH≤4时甚至可稳定6天。在碱性环境中pH为8时稳定性效果较好。研究得出了不同体积分数的螯合剂对碱性抛光液速率稳定性的影响,河北工业大学微电子所研制的螯合剂为多羟多胺有机碱,具有调节pH的作用。随螯合剂的体积分数逐渐增加,碱性抛光液抛光速率的稳定性逐渐变差,因此在研究碱性抛光液配比时应注意螯合剂的体积分数,以提高稳定性。观察和分析了碱性抛光液在全pH值范围内的速率稳定性变化,并将碱性抛光液的pH值调至7以下,在不产生凝胶的前提下观察其速率的稳定性。Through the analysis of the influence of the pH value on the polishing rate stability of the alkaline slurry, the pH value interval was obtained where the polishing rate of the alkaline slurry was relatively stable. In addition, the comparison results with the acidic polishing solution show that the alkaline slurry can be stable for at least 24 hours in the acidic environment, and it can even be stable for 6 days when the pH value is less than or equal to 4. The stability is better in the alkaline environment when the pH value is 8. The effects of the chelator with different vo- lume fractions on the stability of the alkaline slurry rate were obtained through the research. The chelator developed by the Institute of Microelectronics of Hebei University of Technology is mul- tiple hydroxylamine organic alkali, and it can adjust the pH value. With the increase of the chela- tor volume fraction, the polishing rate stability of the alkaline slurry deteriorates gradually, therefore, the researchers should pay more attention to the chelator volume fraction in the study of the alkaline polishing slurry ratio, so as to improve the stability. The change for the stability of the rate for the alkaline polishing liquid in the whole pH range was observed and analyzed. The was observed without the generation of the gel.

关 键 词：PH值 碱性抛光液 稳定性 速率 螯合剂 

分 类 号：TN305.2[电子电信—物理电子学]