光刻版清洗工艺及设备研究  

Study of Photomask Cleaning Process and Equipments

作　　者：刘永进[1] 刘玉倩[1] 宋文超[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2013年第10期9-11,62,共4页Equipment for Electronic Products Manufacturing

摘　　要：光刻版的洁净程度直接影响到光刻的效果,定期对光刻版进行清洗是保证光刻版洁净的必要手段。根据光刻版污染物的特点介绍了多种光刻版清洗工艺及相关设备的种类及组成,最后通过试验考查了工艺设备的使用效果。Whether the photomask is clean affects the quality of exposure, so it is needed to clean photomasks regularly. This article introduced several cleaning processes based on characteristics of contamination, and brought out the constructions of several equipments. In the end the effect was validated on an equipment.

关 键 词：光刻版 清洗 工艺设备 

分 类 号：TN305.97[电子电信—物理电子学]