紫外全息凹面光栅离子束刻蚀技术  

Ion beam etching of ultraviolet concave grating

作　　者：王长庚[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033

出　　处：《长春工业大学学报》2013年第6期640-644,共5页Journal of Changchun University of Technology

基　　金："863"重大项目(2010AA1221091001);国家重大科研装备开发专项(2011YQ120023);国家重大科研装备研制项目(ZBYZ2008-1);中国科学院重大科研装备研制项目(YZ201005);吉林省科技发展计划项目(20070523;20086013)

摘　　要：通过对引出的平行离子束流外加可控磁场,可以实现离子束流偏转。该方法实现IV型凹面光栅沿曲面不同闪耀角离子束刻蚀,能够获得高衍射效率的IV型凹面光栅。经过理论设计计算出理想的IV型凹面光栅闪耀角,利用全息曝光-弯转离子束刻蚀工艺制作出尺寸45mm×40mm,波长250nm处衍射效率达67%,入臂200mm,出臂188mm,曲率半径224mm的IV型凹面光栅。同时,利用平行离子束流制作了相同参数的IV型凹面光栅,其250nm处的衍射效率为30%。实验结果表明,利用弯转离子束流制作IV型凹面光栅的方法简单易行,并能够精确控制离子束流实现高衍射效率的IV型凹面光栅制作。The adjustable magnetic field is added to the parallel ion beam to realize the beam deflection, by which high diffraction efficiency IV-type concave grating can be obtained by ion bean etching at different blaze angles along the IV-type concave surface. The optimal blaze angle is calculated, and the IV-type concave grating is get with the holographic ion beam etching, grating size is 45 mmX 40 mm; diffraction efficiency 67% at 250 nm; input arm 200 mm; output arm188mm and curvature radius 224 mm. The same IV-type concave grating is made with parallel ion beam, and the diffraction efficiency is about 37% at 250 nm. The experimental results demonstrate that curing ion beam itching method is feasible, and the ion beam can be controlled to realized the fabrication of IV concave grating with high diffraction efficiency.

关 键 词：束流控制 衍射效率 离子束刻蚀 凹面光栅 

分 类 号：TP394.1[自动化与计算机技术—计算机应用技术] TH691.9[自动化与计算机技术—计算机科学与技术]