氮气流量对复合离子镀TiAlN薄膜性能的影响  

Influence of nitrogen flows on properties of TiAlN films prepared by hybrid ion plating

作　　者：薛利[1] 黄美东[1] 程芳[1] 刘野[1] 许世鹏[1] 李云珂 

机构地区：[1]天津师范大学物理与材料科学学院,300387

出　　处：《天津师范大学学报（自然科学版）》2014年第1期38-41,共4页Journal of Tianjin Normal University：Natural Science Edition

基　　金：国家自然科学基金资助项目(61078059);天津师范大学创新计划资助项目(52X09038)

摘　　要：利用电弧离子镀和磁控溅射相结合的复合镀技术,在300 V偏压、不同氮气流量下制备了一系列TiAlN薄膜.利用XP-2台阶仪、XRD、SEM和纳米力学测试系统分别对薄膜的沉积速率、晶体结构、表面形貌、硬度和弹性模量等进行测试和分析.实验结果表明:随着氮气流量的增大,薄膜的表面质量逐渐提高,薄膜的硬度和弹性模量均随氮气流量的增大呈现出先增加后减小的变化趋势.TiAlN thin films were prepared by hybrid ion plating, consisting of arc ion plating and magnetron sputtering, with different nitrogen flows at -300 V bias. Deposition rate, crystal structure, surface morphology, hardness and modulus of the films were tested and analyzed by XP-2 profiler, X-ray diffraction （XRD）, scanning electron microscopy （SEM）, nano- indenter, respectively. The results showed that the surface morphology of the films became better with the increase of nitrogen flows. The hardness and modulus of the films increased at first and then decreased with the increase of nitrogen flows.

关 键 词：电弧离子镀 磁控溅射 TIALN薄膜 氮气流量 晶体结构 表面形貌 硬度 

分 类 号：TN919[电子电信—通信与信息系统]