硬X射线聚焦波带片的设计及制作  

Design and Fabrication of High Aspect-ratio Hard X-ray Zone Plates

作　　者：付杰[1] 王晓华[1] 李金华[1] 方铉[1] 魏志鹏[1] 

机构地区：[1]长春理工大学理学院,长春130022

出　　处：《光电工程》2014年第3期7-12,共6页Opto-Electronic Engineering

基　　金：国家自然科学基金项目(61107032);国家自然科学基金面项目(61275170)

摘　　要：针对惯性约束性聚变(ICF)实验中高分辨靶源辐射成像的需要,对结合电子束光刻和X射线光刻制作大高宽比菲涅尔波带片的制作工艺进行了研究。首先采用带有自支撑薄膜的衬底进行电子束光刻和微电镀技术来制作X射线光刻掩膜,以此来降低电子束光刻过程中的背散射,然后采用多次X射线曝光和全水电镀的方法来增强大高宽比图形的抗倒性,从而完成了大高宽比波带片结构的制作。对所制作的自支撑波带片最外环宽度为350 nm,厚度为3.5μm,高宽比达到10,侧壁陡直且具有优良的结构质量,可用于10 keV^30 keV波段的硬X射线成像。The manufacture of high aspect-ratio hard X-ray zone plates for Inertial Confinement Fusion （ICF） experiment by using electron beam lithography and X-ray lithography was demonstrated. The X-ray lithography mask was first fabricated on hollow polyimide film to reduce the back-scattering during electron-beam lithography process. Then multiple X-ray exposures and full water electroplating method were used to increase the lodging resistance of the resist pattern. The zone plates with outermost zone width of 350 nm, profile thickness of 3.5μm, and aspect ratio of 10, were successfully fabricated by using the combined technology. The structure of zone plates is steep and has excellent graphics quality,and can be used for 10 to 30 keV X-ray imaging system.

关 键 词：大高宽比 X射线光刻 电子束光刻 全水电镀 

分 类 号：TN305.7[电子电信—物理电子学]