用激光干涉法实时监控同轴磁控溅射ZnO薄膜的厚度  

Real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering using laser interferometry

作　　者：谢克诚[1] 

机构地区：[1]四川压电与声光技术研究所

出　　处：《激光技术》1991年第6期344-348,共5页Laser Technology

摘　　要：本文介绍了一种在我所生产的 TCJ-300型同轴磁控溅射设备上采用激光实时监控 ZnO 薄膜厚度的方法。实验结果表明,该方法与其它膜厚监控方法相比较具有多种优点:它可以在溅射过程中实时显示薄膜的厚度、均匀性和溅射速率等;本实验装置简单;操作方便;其监控精度优于1.5%。this paper presents a new method of real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering device with laser.TCJ-300 type isoaxis magnetron sputter machine is made in our institute.The experimental results show that this method has more adwantages than other methods of monitoring film thickness have.It can show the homogeneity and the thickness of the film as well as the sputtering velocity in process of sputtering.The experimental set and its operation are simple.The monitoring accuracy of the thick of film is better than 1.5%.

关 键 词：ZNO薄膜 溅射 厚度 监控 激光干涉 

分 类 号：TN304.055[电子电信—物理电子学]