深亚微米ULSI工艺检测技术——扫描探针显微镜  

Deep sub-micron ULSI process measurement :Scanning probe microscope technology

作　　者：王家楫[1] 唐凌[1] 

机构地区：[1]复旦大学国家微分析中心,上海200433

出　　处：《微纳电子技术》2002年第2期38-42,共5页Micronanoelectronic Technology

摘　　要：扫描探针显微镜(SPM)是80年代发展起来的一种具有超高空间分辨率的显微技术。扫描探针显微镜功能强大,在表面科学、生命科学、微电子工业等许多领域得到广泛的运用。随着集成电路的线宽进入深亚微米阶段,扫描探针显微镜在ULSI工艺表征中显得日益重要。本文将介绍扫描探针显微镜及其在微电子工艺和器件微分析中的应用。Scanning probe microscope is an ultra-high spatial resolution technology with a wide range of capabilities.It has been widely used in surface science,biology science,microelectronics etc.As the linewidth of integrated circuit is continuously decreasing,SPM becomes more and more important in ULSI process characterization.This paper gives an overview of SPM technology and its applications in microanalysis of microelectronics process and devices.

关 键 词：SPM ULSI 微分析 扫描探针显微镜 深亚微米 工艺检测技术 

分 类 号：TN16[电子电信—物理电子学]