原子光刻中原子通量的优化研究  

Optimization of Atom Flux in Atom Lithography

作　　者：陈杰[1] 刘杰[1] 朱立 邓晓[1] 程鑫彬[1] 李同保[1] Chen Jie;Liu Jie;Zhu Li;Deng Xiao;Cheng Xinbin;Li Tongbao(School of Physics Science and Engineering,Tongji University,Shanghai 200092,China)

机构地区：[1]同济大学物理科学与工程学院,上海200092

出　　处：《光学学报》2018年第12期20-24,共5页Acta Optica Sinica

基　　金：国家重点研发计划(2016YFA0200902);国家重大科学仪器设备开发专项(2014YQ090709)

摘　　要：原子通量是影响原子光刻技术制备纳米光栅质量的主要因素之一。应用原子炉管喷发量的理论模型,利用理论与实验相结合的方法,对比研究了三类典型原子炉管构型下的原子通量水平,并基于最优原子炉管构型将研制的铬纳米光栅峰谷高度提升到100nm,使光栅质量得到进一步优化。Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography.Based on the theoretical model of eruption volume of atomic furnace tube,the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment.Moreover,with the best furnace tube configuration,the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm,which further optimizes the quality of nano-gratings.

关 键 词：原子与分子物理学 纳米计量 传递标准 原子光刻 纳米光栅 原子通量 

分 类 号：O562[理学—原子与分子物理]