溅射气体流量比对磷掺杂ZnO光学性质的影响  

Effect of Sputtering Gas Flow Ratio on the Optical Properties of Phosphor Doped ZnO

作　　者：解玉鹏[1] 王显德[1] XIE Yupeng;WANG Xiande(College of Science,Jilin Institute of Chemical Technology,Jilin City 132022,China)

机构地区：[1]吉林化工学院理学院,吉林吉林132022

出　　处：《吉林化工学院学报》2019年第1期79-82,共4页Journal of Jilin Institute of Chemical Technology

基　　金：吉林化工学院校级项目(2015053);吉林化工学院校级博士启动项目(2015129);吉林化工学院重大科技项目(2015011)

摘　　要：采用磁控溅射方法在石英衬底上制备ZnO薄膜,利用XRD对薄膜结构进行表征,发光光谱和透射吸收光谱表征薄膜的光学性质,讨论了溅射气体流量比对薄膜光学性质的影响.结果表明,当Ar/O_2为1/0.05时,观察到明显的紫外发光,带隙宽度为3.310 e V.ZnO films were prepared on quartz substrates by magnetron sputtering,the film structure was characterized by XRD,and the optical properties of the films were characterized by photoluminescence and transmission spectra,and the effect of the sputtering gas flow ratio on the optical properties of the films was discussed.The results show that when the Ar/O2 is 1/0.05,the visible ultraviolet light is observed and the band gap width is 3.310 eV.

关 键 词：磁控溅射 ZNO薄膜 P型 光学性质 

分 类 号：O474[理学—半导体物理]