a-C:F薄膜的热稳定性与光学带隙的关联  

Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films

作　　者：杨慎东[1] 宁兆元[1] 黄峰[1] 程珊华[1] 叶超[1] 

机构地区：[1]苏州大学物理系,苏州215006

出　　处：《物理学报》2002年第6期1321-1325,共5页Acta Physica Sinica

摘　　要：以CF4和C6H6的混合气体作为气源 ,在微波电子回旋共振化学气相沉积 (ECR CVD)装置中制备了氟化非晶碳薄膜 (a C :F) ,并在N2 气氛中作了退火处理以考察其热稳定性 .通过傅里叶变换红外吸收谱和紫外 可见光谱获得了薄膜中CC双键的相对含量和光学带隙 ,发现膜中CC键含量与光学带隙之间存在着密切的关联 ,在高微波功率下沉积的氟化非晶碳膜具有低的光学带隙和较好的热稳定性 .Fluorinated amorphous carbon films were deposited using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF 4 and C 6H 6 as source gas and were annealed in nitrogen ambience in order to investigate their thermal stability.The relative concentration of CC bond and optical bandgap were obtained by Fourier transform infrared (FTIR) spectroscopy and Ultraviolet-Visible(UV-VIS)spectrum respectively.It demonstratesd that there is a close relationship between relative concentration of CC bond and optical bandgap, and the films deposited at higher microwave power have a lower optical bandgap and better thermal stability.

关 键 词：a-C:F薄膜 氟化非晶碳膜 光学带隙 退火温度 热稳定性 超大规模集成电路 

分 类 号：O484.41[理学—固体物理]