非晶薄膜的硬度测量  

Hardness Measurements of Amorphous Thin Films

作　　者：钟伯强[1] 朱文娟[1] 陆忠乾[1] 

机构地区：[1]中国科学院上海硅酸盐研究所

出　　处：《无机材料学报》1991年第3期380-381,共2页Journal of Inorganic Materials

摘　　要：用努普(Knoop)压痕法测量了沉积在普通玻璃上的 ITO,SnO_2和非晶硅薄膜的硬度。在0.245N 负荷下测得它们的硬度分别是7232、7987和4929MPa。这些薄膜材料的硬度取决于薄膜制备方法和制备时的工艺条件,同时也与测量方法有关。不同衬底温度时沉积的非晶硅薄膜,其硬度随温度降低而减小,这与非晶硅薄膜中所含的氢的多少有关。The hardness of amorphous silicon films deposited on common window glasshas been measured by using Knoop indentation method under a load of 0.245 N.The hardness values of ITO,SnO_2 and a-Si films are 7232,7987 and 49(?)9 MParespectively.The hardness of these films depends on not only measuring methods,but also processing methods.The hardness of a-Si films deposited at different tem-peratures is decreased with the decrease of temperatures of substrate.It is consideredthat this decrease depends on the amount of hydrogen included in a-Si films.

关 键 词：ITO SNO2 薄膜 非晶硅 硬度 

分 类 号：O484.5[理学—固体物理]