等离子体化学气相沉积的布气装置之设计  

Design of gas distributor on plasma chemical vapour deposition

作　　者：黄绍江[1] 谢红希[1] 侯惠君[1] 戴达煌[1] 

机构地区：[1]广州有色金属研究院材料表面工程技术研究开发中心,广东广州510651

出　　处：《广东有色金属学报》2002年第1期21-25,共5页Journal of Guangdong Non-Ferrous Metals

摘　　要：推导了在设计真空镀膜设备时 ,计算镀膜室内布气管的直径和出气孔孔径的公式 ,di =[d-41- D-4L∑im=2(n + 1- m) /(h + 10 -6Bq) ]-1/4 ,以达到均匀布气的目的 .给出了在等离子体化学气相沉积设备中的计算实例及应用情况 ,实践证明 ,用此公式设计真空镀膜均匀布气装置是可行的 .In this paper, the formulas of the diameter of gas spreader in deposition room and its hole diameter, d i=[d -4 1-D -4 L∑[DD(;]im=2(n+1-m)/(h+10 -6 Bq)] -1/4 , were calculated during design of vacuum deposition. Uniform distribution gas can be conducted according to these formulas, and its application example was given in the plasema chemical vapour deposition device. These formulas were proved to be practicable in design of uniform gas distributor for vacuum deposition. -1/4 , were calculated during design of vacuum deposition. Uniform distribution gas can be conducted according to these formulas, and its application example was given in the plasema chemical vapour deposition device. These formulas were proved to be practicable in design of uniform gas distributor for vacuum deposition.

关 键 词：等离子体化学气相沉积 布气装置 设计 真空沉积 流量分布 管道流动 

分 类 号：TG174.444[金属学及工艺—金属表面处理]