多层复合真空离子镀膜技术的新发展  

New development of ion coating equipment in multi-layer film

作　　者：王增福[1] 陈步亮[1] 范斌[1] 张再鸣[1] 李然[1] 

机构地区：[1]中国空间技术研究院,北京100029

出　　处：《真空》2002年第3期10-12,共3页Vacuum

摘　　要：本文回顾了多弧——磁控溅射多功能离子镀膜设备的结构和功能 ,并且对该设备在氮化钛掺金离子镀 (IPG)方面的典型应用 ,做了较为详细的膜层性能分析。同时 ,本文又对近年来一种新型的多功能离子镀设备——复合式离子镀膜设备的结构及特点做了介绍 ,给出了该类型设备的典型应用场合 ,并且向读者介绍了使用该设备镀制的金属 /金属陶瓷多层膜的优异性能。The structure and the function of multi-arc and sputtering coating machine are reviewed, and the coating properties of TiN+Au(IPG) are prepared by this kind of machine discussed. Then, the structure and the feature of this kind of new multi-function ion plating machine, composite ion coating machine, are introduced. We can find its some model application in the field of surface plating. A special multi-layer coating of metal/cermets was prepared by the machine which has very excellent performance.

关 键 词：多层复合真空离子镀膜技术 离子镀 多层镀 磁控溅射 镀膜设备 

分 类 号：TQ153[化学工程—电化学工业] TB43[一般工业技术]