原子纳米光刻中双层光学掩膜的实现方法研究  

Production of double-layer light mask in atom nano-lithography

作　　者：陈晟[1] 马艳[1] 张萍萍[1] 王建波[1] 邓晓[1] 肖盛炜 马蕊[1] 李同保[1] 

机构地区：[1]同济大学物理系,上海200092

出　　处：《红外与激光工程》2014年第7期2070-2073,共4页Infrared and Laser Engineering

基　　金：国家自然科学基金(10804084;91123022);上海纳米专项(0852nm07000;0952nm07000);国家科技支撑计划(2006BAF06B08);国家教育部博士点基金(200802471008)

摘　　要：利用原子光刻的方法制备纳米结构的光栅已经成为了一种较为成熟的工艺。通过原子与激光驻波场的相互作用,利用原子自生在势能场中的偶极力对原子的密度进行调制,从而得到所需要的光栅结构。利用此种工艺所制备的光栅相对于传统工艺来说具有精度高,光栅常数直接溯源于原子能级。希望能够通过对激光的改良来提升原子沉积结果。通过双层驻波场来提高原子沉积质量已经被多次提到。实验中利用几何光学的方法实现了所需要的新型激光驻波场。并对其汇聚,相干等特性进行了研究,取得了较为满意的结果。为利用双层驻波场来沉积原子打下了基础。Taking advantage of atom lithography to produce the nano level grating has become a mature process technology in nano fabrication. When the atoms pass through a standing wave field, using the dipole force on the atoms is a new technology to build the nanostructures. The grating obtained by this method has its special characteristic. Its period is directly related to the wavelength of laser and this can be reviewed to the transition frequency of the atom. It is hoped to use a new kind of light mask to improve the deposition quality. Using double-layer light mask have been mentioned for several times. In the experiment, geometrical optics were used to achieve what we need. A prism was designed to generate this special beam. From the experiment result, the beam is well generated. This kind of beam can be easily used in the subsequent experiment.

关 键 词：原子光刻 光学掩膜 异形光束 几何光学 

分 类 号：TN405[电子电信—微电子学与固体电子学]