衬底温度对脉冲激光沉积氧化锌薄膜性能的影响  

Influence of Substrate Temperature on the Properties of ZnO Thin Films Grown by Pulsed Laser Deposition

作　　者：赖冬寅[1] 李烨[2] 司马立强[2] 王雷[3] 

机构地区：[1]四川工商职业技术学院机电工程系,四川成都611837 [2]西南石油大学资源与环境学院,四川成都610500 [3]南京工业大学理学院,江苏南京211816

出　　处：《铸造技术》2014年第7期1468-1470,共3页Foundry Technology

摘　　要：采用脉冲激光沉积（PLD）技术,在Si（100）衬底上制备出高度c轴取向的ZnO薄膜。运用X射线衍射（XRD）、光致发光谱（PL）、拉曼光谱（Raman）对衬底温度在300-700℃条件下沉积的氧化锌薄膜进行表征,研究了衬底温度对氧化锌薄膜结构和发光特性的影响。实验表明,700℃条件下沉积的薄膜具有相对较好的结晶质量,其X射线衍射峰半高宽（FWHM）最窄,晶粒最大,近带边紫外发光峰与深能级发光峰的比值显著增强。ZnO thin film was prepeared on Si（100） substrate at different temperatures by PLD. The structure and luminescence properties were studied by X-ray diffraction, photoluminescence and raman spectra. The results show that the film grown at 700 ℃ has the best quality, and its FWHM is the narrowest, grain size is the biggest. The UV peak of the film is remarkably enhanced.

关 键 词：衬底温度 氧化锌薄膜 结构特性 发光特性 脉冲激光沉积 

分 类 号：TB383.2[一般工业技术—材料科学与工程]