用于光刻系统仿真的多边形处理算法  

Polygon processing algorithms for lithography system simulation

作　　者：吕楠[1] 史峥[1] 罗凯升[1] 耿臻[1] 

机构地区：[1]浙江大学超大规模集成电路设计研究所,浙江杭州310027

出　　处：《传感器与微系统》2014年第9期124-127,共4页Transducer and Microsystem Technologies

基　　金：国家自然科学基金资助项目(61204111)

摘　　要：为提高光刻仿真效率,通过对光刻原理进行研究,提出了2种多边形处理算法,将掩模上的多边形图案进行切分优化,将其划分成若干矩形或三角形。在Linux环境下应用C语言设计出一个完整的光刻仿真系统,设计的具体光学参数为:光源波长为193nm,数值孔径为0.3~0.8,部分相干系数可调范围为0.2~0.8,可一次性仿真1μm×1μm到10μm×10μm范围内的45 nm^0.18μm工艺的复杂版图,并通过多次实验进行验证。实验结果表明:原版图图像的边缘细节得到保留,且该算法有效地减少了光刻模拟的计算复杂度与计算时间,整体效率提升20%以上,为当前智能传感器系统芯片的制造节省了宝贵时间。In order to improve efficiency of lithography simulation, by studying the principles of lithography propose two kinds of polygon processing algorithms, and split polygons into a plurality of rectangles or triangles. Furthermore, use C language to design a complete lithography simulation system in Linux operating system. The specific optical parameters are：the wavelength of light source is 193 nm, the numerical aperture is at range of 0.3 0.8, and adjustable range of partially coherent coefficient is of 0.2 ~0.8, and it can simulate eomplieated layout of 45 nm-0.18 μm,whose area may be from 1 μm ×1 μm to 10 μm ×l0 μm,and is verified by several experiments. Experimental results show that the edge details are preserved and the algorithm effectively reduces the computational complexity and computation time of lithography simulation, and the overall efficiency is improved over 20 % ,which saves time for manufacture of chip of intelligent sensor system.

关 键 词：传感器 多边形切分 光刻仿真 光学邻近效应 部分相干系数 

分 类 号：TP312[自动化与计算机技术—计算机软件与理论]