DMD无掩模光刻机主控软件系统的设计  

Design of the Host Computer System for the DMD Maskless Lithography Machine

作　　者：冯金花[1] 胡松[1] 李艳丽[1] 何渝[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都610209

出　　处：《微纳电子技术》2014年第10期673-678,共6页Micronanoelectronic Technology

摘　　要：根据无掩模光刻机的整体结构和工作流程,开发了一款适用于DMD无掩模光刻机的曝光软件。对系统进行了整合,运用开发环境VS2010实现了各个独立的模块的设计。通过串口通信的方式与下位机建立连接,实现对工件台的控制;依托Access2007创建数据库,管理曝光数据及工艺文件;采用图像处理算法和坐标转换技术,实现了曝光过程中的实时自动调焦和套刻对准功能,具有良好的人机交互界面。实验结果表明,软件界面设计友好,上、下位机数据传输稳定,能对工艺文件和曝光实验数据进行管理;上位机软件实现的自动调焦和自动对准功能具有很好的稳定性和可靠性。According to the overall structure and work flow of the maskless lithography machine,the exposure software used to the DMD maskless lithography machine was developed.The system integration was carried out,the designs of each independent module were realized using the VS2010.Using the means of serial communication to connect the lower machine,the control of the platform was achieved.Based on the Access2007,the database was created to manage the exposure data and process files.Using the image processing algorithm and the coordinate transformation,the real-time auto focusing and alignment functions were realized in the process of exposure,having the good human-computer interaction interface.The experimental results show that the interface design of the system is good,the data transmission between the upper and lower machine is stable,and the system can manage the exposure data and process files.Besides,the realized auto focusing and alignment functions of the upper machine software have good stability and reliability.

关 键 词：无掩模光刻 数字光刻 数据管理 调焦 对准 

分 类 号：TP319[自动化与计算机技术—计算机软件与理论] TN305.7[自动化与计算机技术—计算机科学与技术]