光刻用准分子激光器能量稳定性影响因素分析(英文)  

Analysis on factors affecting energy stability of excimer laser for lithography

作　　者：石海燕[1,2] 赵江山[1] 宋兴亮[1,2] 沙鹏飞[1] 单耀莹[1] 王倩[1] 翟晔[1,2] 周翊[1] 

机构地区：[1]中国科学院光电研究院,北京100094 [2]中国科学院大学,北京100049

出　　处：《红外与激光工程》2014年第11期3540-3546,共7页Infrared and Laser Engineering

基　　金：国家重大科技专项(2012zx02701001-010)

摘　　要：以Cymer公司为例归纳总结了ArF准分子激光器双腔放大结构及相应的脉冲能量稳定性的发展历程,讨论了双腔能量放大机制对脉冲能量稳定性的影响,重点分析了MOPRA结构较MOPA结构在能量稳定性方面的优缺点。着重阐述了放电腔内工作气体成分、配比、电极间流速对脉冲能量稳定性的影响以及相应的改善措施,并结合影响脉冲能量稳定性的因素简述能量控制系统在稳定脉冲能量上的应用。The development of the dual- chamber amplification structure of ArF excimer laser in Cymer was reviewed. Corresponding pulse energy stability was also concluded. The effect of dual- chamber amplification mechanism on pulse energy stability was analyzed. Especially, the MOPRA structure and the MOPA structure are compared. The gas components, proportion of working gases and gas flow rate between electrodes in the discharge chamber,which have strong influence on the pulse energy stability, were also discussed. Corresponding measures were presented to improve energy stability. Finally, the energy servo system was introduced briefly.

关 键 词：放大机制 准分子激光器 脉冲能量稳定性 气体成分 

分 类 号：TN248.2[电子电信—物理电子学]