全自动光刻版清洗机工艺原理与工作过程介绍  

Introduction to the Process and the Operating of the Automatic Photomask Cleaning Equipment

作　　者：宋文超[1] 刘永进[1] 王刚[1] 张利军[1] 侯为萍[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2014年第2期23-27,37,共6页Equipment for Electronic Products Manufacturing

摘　　要：介绍了常用的光刻版清洗工艺,并详细讲解了全自动光刻版清洗机的工作过程。同时,简单介绍了为提高光刻版清洗效果而设计的浸泡系统、药液供给与循环系统和温控系统。Photomask cleaning processes are introduced. With one of the processes,the operating of the automatic photomask cleaning equipment is present. The principle of the photomask immersion tank,chemical supply and recycle system,and temperature control system are also introduced.

关 键 词：半导体 光刻版清洗 单晶圆清洗 自动设备 

分 类 号：TN305.97[电子电信—物理电子学]