浴法抛光中抛光粉粒径对去除效果影响的试验研究  

Experimental study of the influence of slurry particle size on material removal consequent in bowl-feed polishing

作　　者：张杨[1] 徐清兰[2] 陈梅[1] 张蓉竹[1] 

机构地区：[1]四川大学电子信息学院,四川成都610064 [2]中国科学院光电技术研究所,四川成都610209

出　　处：《光学技术》2014年第6期486-491,共6页Optical Technique

摘　　要：为了分析抛光粉粒径对材料去除效果的影响,选用不同的平均粒径以及不同比例混合氧化铈抛光粉分别对K9玻璃进行了抛光试验。对抛光后的工件表面粗糙度及去除量进行了定量研究。结果表明,在试验条件相同的情况下,不同平均粒径的抛光粉,粒径越小,抛光后的元件表面粗糙度越好。从使用不同比例的混合抛光粉试验中可以看出,粒度的均匀性是影响工件表面粗糙度的重要因素。结合抛光粉粒度分布图和试验结果可以看出,抛光粉粒子的分布范围越小,以及各粒径大小分布在峰值附近的粒子所占体积百分比越接近,加工后的工件表面粗糙度越小。in order to analyze the influence of slurry particle size on materials removal consequent,in experiment,different average size and different proportions of slurry particle are chosen to polish the K9 glass.After polishing progress,the result of quantitative research on the material removal rate and roughness shows that,under the same experiment condition,the smaller the average size of slurry particle are,the smaller the roughness of the workpiece can be obtained.In the experiment about different proportions of slurry particle,the uniformity of slurry particle is a very important factor to influence the surface roughness.Under the condition that near the peak of the particle size distribution there is similar percentage,the range of the particle size is more smaller,the surface roughness after polishing is more smaller.

关 键 词：浴法抛光 抛光粉粒径 抛光粉均匀性 表面粗糙度 去除速率 

分 类 号：TG58[金属学及工艺—金属切削加工及机床]