大流量超纯氢气纯化设备制造技术  

Fabrication of a High-Flow Ultra-Pure Hydrogen Purification System

作　　者：熊化兵[1] 李文[1] 陈洪波[1] 谈长平[1] 

机构地区：[1]信息产业部电子第二十四研究所,重庆400060

出　　处：《微电子学》2002年第2期152-153,160,共3页Microelectronics

摘　　要：超纯氢气 (大于 6N)是半导体硅外延等工艺必备的工艺气体。文章介绍了利用超低温吸附的方法提纯大流量超纯氢气的工作原理 ,设备制造中的关键技术问题及难点 。Ultra pure hydrogen (>6N) is a process gas necessary for silicon epitaxy in semiconductor industry.A cryo adsorption method is used to purify high flow ultra pure hydrogen The principle of the method is described, and key technologies for the fabrication of the purification system are presented.Finally, the operation performance of the high flow ultra pure hydrogen purification system based on this technique is also introduced

关 键 词：硅外延 半导体工艺 超纯氢气 超低温吸附 纯化设备 

分 类 号：TN304.12[电子电信—物理电子学]