波导材料二氧化硅厚膜的快速生长  

The Deposition of Silica Wave-guide Material

作　　者：吴远大[1] 邢华[1] 张乐天[1] 李爱武[1] 郑伟[1] 刘国范[1] 张玉书[1] 

机构地区：[1]吉林大学电子系光电子国家重点实验室,长春130023

出　　处：《高技术通讯》2002年第1期43-46,共4页Chinese High Technology Letters

基　　金：国家 973(G2 0 0 0 36 6 0 2 )资助项目

摘　　要：采用火焰水解法 (FHD)在Si片 (4 .5cm )上快速淀积疏松多孔的SiO2 厚膜材料 ,淀积速率达 8μm/min。然后将该材料分别在真空 /空气气氛中高温致密化处理 ,获得了各种形态的二氧化硅厚膜。其中包括平整度好、光滑透明的玻璃态SiO2 厚膜 ,该膜厚度达到 4 0 μm以上 ,完全适合制作平面光波导器件。最后 ,利用XRD、SEM、光学显微镜等仪器对SiO2 膜的表面和膜厚进行了测试分析 ,并讨论了影响致密化SiO2SiO 2 thick films were rapidly deposited on silicon substrate by Flame Hydrolysis Deposition (FHD) method, and the deposition speed is as high as 8μm per minute. Then, the films were consolidated in electric furnaces in vacuum or air ambience, and several kinds of silica films were obtained, including the uniform transparent silica glass of 40μm in thickness. Finally, the silica films were analyzed with XRD, SEM, microscope, etc. And several factors affecting the structure of consolidated films were discussed.

关 键 词：波导材料 二氧化硅厚膜 火焰水解法 致密化 FHD 玻璃态SiO2 薄膜生长 

分 类 号：TN252[电子电信—物理电子学]