SU-8胶光弹性性能显微测试  

Micro-measurement of SU-8 photoelastic performance

作　　者：褚金奎[1] 李双亮[1] 张然[1] 

机构地区：[1]大连理工大学机械工程学院,辽宁大连116023

出　　处：《光学精密工程》2016年第3期547-552,共6页Optics and Precision Engineering

基　　金：国家自然科学基金(No.51175056);国家973重点基础研究发展计划资助项目(No.2011CB302101);中央高校基本科研业务费专项资金资助项目(DUT14RC(3)006);中国博士后科学基金(2014M561226)资助课题

摘　　要：考虑获知SU-8胶的光弹性性能有利于拓展其在微纳米领域中的应用范围,本文设计了材料应力光学系数显微测量光路,完成了SU-8胶应力光学系数的测量实验。首先,基于光弹性原理设计了测量光路,推导了求解应力光学系数的计算公式;然后,根据所设计的光路搭建了应力光学系数显微测量实验装置,在SU-8胶试样光弹性条纹的单个半级数范围内进行了单向拉伸实验;最后,利用Matlab提取实验照片组中光强值信息,得到了不同拉力下透过SU-8胶试样的单色光光强值,计算求解出了SU-8胶的应力光学系数。实验结果以及测量公式计算显示,SU-8胶的应力光学系数为(3.007±0.149)×10–11 m2/N,大于光学玻璃等材料的应力光学系数,也远大于二氧化硅等MEMS领域常用材料的应力光学系数。实验结果可为以SU-8胶为材料,通过光弹性原理进行微力测量的微探针、微夹钳等的设计与制作打下基础。The photoelastic performance of SU-8 photoresist is related to extending its applications to the field of MEMS（Micro-electronic-mechanical System）. Therefore, this paper designs a micro-measuring path to obtain the stress-optical coefficient of the SU-8, and implements the measurement experiment of SU-8 photoelastic performance. Firstly, based on the photoelastic mechanism, the micro-measuring optical path was designed and the formulas for the calculation of SU-8 stress-optical coefficient were deduced. Then,, the experiment devices for photoelastic microscopic measurement were built according to the designed optical path, and the tensile test of SU-8 specimen was conducted in the scope of the half order of a single photoelastic fringe. Finally, through extracting the values of the light intensity from the experimental photographs by Matlab, the light intensity of monochromatic light penetrated throught the SU-8 specimen under different tensile forces were measured and the value of SU-8 stress-optical coefficient was calculated. The experimental results and the calculation of measurement formulas show that the stress-optical coefficient of SU-8 is （3.007±0.149）x 10-11 m2/N, greater than that of normal optical glass and other materials commonly used in MEMS fields, such as silica. The experimental results can lay a foundation for the design and manufacturing of micro-grippers and micro-probes made from the SU-8 materials and used for the force measurement through photoelastic mechanisms.

关 键 词：光学测量 显微测量 光弹性分析 SU-8胶 应力光学系数 

分 类 号：TN305.7[电子电信—物理电子学]