PDMS软模板制备与叶片曲表面软光刻工艺  

Fabrication of the PDMS Soft Mask and Soft-Lithography Process on the Non-Planar Blade

作　　者：高均超[1] 段力[1] 王英[2] 刘民[2] 王凤丹[2] 丁桂甫[1] 王强 郑芳芳 邵靖 

机构地区：[1]上海交通大学电子信息与电气工程学院,上海200240 [2]上海交通大学AEMD先进电子材料与器件平台,上海200240 [3]上海中航商用航空发动机制造有限责任公司,上海201108

出　　处：《微纳电子技术》2016年第5期333-339,共7页Micronanoelectronic Technology

基　　金：中航集团航空发动机联合研发合作项目(GO030002)

摘　　要：介绍和表征了一种制作聚二甲基硅氧烷(PDMS)软模板的工艺方法,并实现了非平面微加工工艺的图形转移。首先采用深硅电感耦合等离子体(ICP)刻蚀工艺制备了具有图形的硅片硬母版,然后用PDMS对硅片硬母版进行倒模复制,从而得到具有图形的PDMS软模板。对所制备的PDMS软模板和硅片硬母版结构的形貌、结构尺寸进行观测对比,结果显示PDMS软模板成功复制了硅片上的图形。将α-氰基丙烯酸乙酯旋涂到PDMS软模板上,然后将PDMS软模板上的图形转印到航空发动机叶片表面进行二次复制。在叶片表面得到的图形化结果为MEMS传感器的制作打下了坚实的基础。本实验提出的这种用PDMS转印的软光刻工艺可代替传统的光刻工艺,能够普遍适用于曲表面的三维结构集成制造。The fabrication technique of the polydimethylsiloxane（PDMS）soft mask was introduced and characterized,and the pattern transfer of the non-planarmicro processing technique was realized.Firstly,a deep trench on the silicon wafer was fabricated with the silicon deep inductively coupled plasma（ICP）etching process and the pattern of the silicon wafer was copied with the PDMS by the reverse mould,then the patterned PDMS soft mask was obtained.The morphologies and structure sizes of the prepared PDMS soft mask and silicon wafer hard mask were observed and compared,and the results show that the pattern of the silicon wafer hard mask was successfully copied on the PDMS soft mask.Alpha-ethylcyanoacrylate was spin-coated on the PDMS soft mask,and then the pattern on which was transferred to the turbine blade surface.The prepared patterns on the surface of the blade lay a solid foundation for the fabrication of the MEMS sensor onto the non-planar metallic component.The proposed soft-lithography technology using PDMS to transfer can replace the traditional photo lithography technology and be widely used for the integrated fabrication of 3D structures on the non-planar blade.

关 键 词：聚二甲基硅氧烷(PDMS) 电感耦合等离子体(ICP) 软光刻 纳米压印 叶片 

分 类 号：TH703[机械工程—仪器科学与技术] TN305.7[机械工程—精密仪器及机械]