硅基板表面电沉积法制备HAP涂层及表征  

Preparation and Characterization of HAP Coating on the Silicon Substrate by Electrodeposition

作　　者：岳雪涛[1] 田清波[1] 张丰庆[1] 孙德明[1] 孙康宁[2] 

机构地区：[1]山东建筑大学材料科学与工程学院,济南250101 [2]山东大学材料液态结构及其遗传性教育部重点实验室,济南250061

出　　处：《硅酸盐通报》2016年第4期1188-1191,1197,共5页Bulletin of the Chinese Ceramic Society

基　　金：山东建筑大学博士科研基金(XNBS1435)

摘　　要：在含有Ca^(2+)和PO_4^(3-)的电沉积液中,以硅基板为阴极,在其表面制备了HAP涂层,并用XRD、SEM、AFM及纳米压痕对涂层进行表征。通过对不同电沉积时间的涂层进行分析,可知加上电压后可以快速的在硅基板表面形成HAP的涂层,随着沉积时间延长,晶粒长大,涂层增厚,并在涂层上产生裂纹。由XRD图谱可知在最初阶段形成的HAP晶粒结晶度低,为无定型态状态,随着电沉积时间延长,组成涂层的晶粒结晶程度提高,XRD峰值增大变得尖锐。AFM分析表明晶粒生长均匀,粗糙度较低,纳米压痕测试结果显示涂层的力学性能较低。The HAP coating was prepared on silicon substrate in the solution which contained Ca-（2＋） and PO_4-（3-） and characterized by the means of XRD,SEM,AFM and nanoindentation analysis. By the analysis of Ca-P coating with different electrodeposition duration it was found that HAP coating grown on the silicon substrate at once when current was turn on. With the electrodeposition duration extended for a long time the coating thickened and crystals volume of coating increased which accompanied by cracks.By XRD patterns at the initial stage the crystals of HAP were immature and had lower crystallinity. With an increase of electrodeposition duration the crystallinity of HAP is higher than before and the diffraction peak of calcium phosphate became shaper and stronger. The results of AFM and nanoindentation analysis showed that the HAP coating had a low mechanical properties and numerical small surface roughness and crystals of coating evenly developed.

关 键 词：硅基板 电沉积 HAP涂层 

分 类 号：TQ175[化学工程—硅酸盐工业]