光刻机用精密碳化硅陶瓷部件制备技术  

Preparation of High Precision SiC Components for Lithography Equipment

作　　者：刘海林[1] 霍艳丽[1] 胡传奇[1] 黄小婷[1] 王春朋[1] 梁海龙[1] 唐婕[1] 陈玉峰[1] 

机构地区：[1]中国建筑材料科学研究总院,北京100024

出　　处：《现代技术陶瓷》2016年第3期168-178,共11页Advanced Ceramics

摘　　要：本文介绍了光刻机用碳化硅陶瓷结构件的特点及其对材料的要求,分析了碳化硅陶瓷在光刻机中作为结构件材料使用的优势,着重介绍了中国建筑材料科学研究总院在精密碳化硅结构件的制备领域所取得的技术成果,列举了精密碳化硅结构件在光刻机等集成电路制造关键装备中的应用。Based on the introduction of the characteristics and requirements of structural ceramic components used in semiconductor especially lithography equipment, the application advantages of silicon carbide ceramics were analyzed. Then the technical achievements in the field of making high precision silicon carbide components made by China Building Materials Academy（CBMA） during the last 10 years were outlined. Typical silicon carbide components such as vacuum chuck, handling arms, trays, stage, integrated mirrors for stage which made by CBMA were also shown in this paper.

关 键 词：碳化硅 凝胶注模 素坯加工 反应连接 化学气相沉积 集成电路 光刻机 

分 类 号：TB321[一般工业技术—材料科学与工程]