MPCVD法玻璃上高光透率类金刚石膜的沉积  

Deposition of High Optical Transparency Diamond-like Carbon Film on Glass Substrate Using MPCVD

作　　者：孙祁[1] 翁俊[1] 刘繁[1] 周璐[1] 汪健华 

机构地区：[1]武汉工程大学材料科学与工程学院湖北省等离子体化学与新材料重点实验室,武汉430074

出　　处：《真空电子技术》2016年第3期40-42,共3页Vacuum Electronics

基　　金：国家自然科学基金(No.11175137);湖北省教育厅项目(Q20151517)

摘　　要：本实验使用石英钟罩微波等离子体化学气相沉积装置,采用"四步沉积法"在含有Ti原子层的玻璃表面,沉积类金刚石膜。保证其他参数不变,通过沉积温度的改变来研究温度对类金刚石膜表面形貌及光透过率的影响。结果表明,提高沉积温度可减少类金刚石膜表面的团聚,提高平整度,同时,提高沉积温度可提高光透过率,当温度为650℃,光透过率为94.8%。In this study, a flat-top bell jar microwave plasma CVD reactor was used to deposit diamond- like carbon film on Ti atom pre-sputtered glass substrate. The ＂four-step＂ method was applied. The influ ence of deposition temperature on surface morphology and optical transparency was studied while all other parameters were kept fixed. The result shows that the increase of deposition temperature helps to decrease the clustering and the surface roughness. The optical transparency was also improved while the temperature increased. The optical transparency was 94.8% when the deposition temperature was 650℃.

关 键 词：微波等离子体化学气相沉积 类金刚石 光透过率 

分 类 号：TQ164[化学工程—高温制品工业]