嵌段共聚物的导向自组装  

Directed Self-Assembly of Block Copolymers

作　　者：王倩倩[1] 吴立萍[1] 王菁[1] 王力元[1] 

机构地区：[1]北京师范大学化学学院,北京100875

出　　处：《化学进展》2017年第4期435-442,共8页Progress in Chemistry

摘　　要：嵌段共聚物由于其在纳米尺度的自组装能力,通过在薄膜中的自组装可以得到特征尺寸小于10nm的周期性图形结构,近年来被广泛研究。导向自组装(Directed Self-Assembly,DSA)充分利用了嵌段共聚物在薄膜中进行自组装的优点,将"自下而上"的嵌段共聚物薄膜自组装技术和"自上而下"的光学光刻或电子束光刻等制备导向图形的技术结合起来。嵌段共聚物通过分子设计可得到层状、柱状、孔洞状等形貌多样的纳米结构。光刻模板表面的化学不均匀性使得嵌段共聚物和基底表面之间的相互作用可控,从而引导嵌段共聚物薄膜在一定的空间取向上定向排列。目前在导向自组装中常用的两种方法有直接在基底表面通过光刻制得前图形模板的制图外延法(几何控制)和基于对光刻模板表面进行化学修饰比如在模板表面接枝上一层中性层材料,从而通过化学诱导实现嵌段共聚物的定向自组装的化学外延法(化学控制)。导向自组装技术通过对微相结构的裁剪、表面修饰和尺寸控制,可以得到特征尺寸更小、密度更大、有序性更好的纳米图形,正逐渐成为最有前途的先进光刻技术方法之一。Block Copolymers（BCPs） have been investigated widely in recent years due to their ability of selfassembly in nanoscale and periodical patterns with feature sizes below 10 nm in thin films. Making use of the advantages of self-assembly of block copolymers in thin films, directed self-assembly（DSA） of block copolymers combines the ＂bottom to top＂self-assembly of block copolymers in films and the ＂up to down＂optical lithography or e-beam lithography technologies to prepare guide templates. Morphology diversity of nanostructures such as layer,columnar and holes can be obtained by molecular design of block copolymers. The pattern-wise introduction of chemical heterogeneity on the substrate surface allows the energetic of the polymersurface interaction to be controlled in a spatially localized way that directs the alignment of block copolymer domains in films. Two main methods of self-assembly considered so far have been the grapho-epitaxy（topographic guiding patterns）,which is based on creating pre-pattern on the surface of the template by lithography,and the chemical-epitaxy（chemical guiding patterns）,which is based on the surface chemical modification of the template to direct the self-assembly process for instance by grafting a neutral layer material.Consequently,with higher resolution,denser and better ordered nano-patterns can be fabricated by tailoring,surface modification and size-control on micro phase and DSA is becoming one of the most promising advanced lithography technologies.

关 键 词：导向自组装 嵌段共聚物 光刻 分辨率 制图外延 化学外延 

分 类 号：O631.22[理学—高分子化学] O631.1[理学—化学]