高精度电子束光刻技术在微纳加工中的应用  

Application of High Resolution Electron Beam Lithography Technology in Micro-and Nano-fabrication

作　　者：胡超 王兴平 尤春 孙锋[2] 

机构地区：[1]无锡中微掩模电子有限公司,江苏无锡214135 [2]中国电子科技集团公司第58研究所,江苏无锡214072

出　　处：《电子与封装》2017年第5期28-32,36,共6页Electronics & Packaging

摘　　要：对电子束光刻系统的原理以及在微纳加工领域的应用进行了讨论。首先对光刻系统的工作原理进行了阐述。然后讨论了电子束光刻的关键工艺,如光胶的选择、剥离工艺的优化以及邻近效应对图形的影响及修正方法。由于电子束光刻在科研领域展现了巨大的潜力,因此吸引了许多学者的注意。最后,举例介绍了电子束光刻在生物医学和硅光电子上的应用。In the paper, the principle of Electron Beam Lithography（EBL） and the application in micro-and nano-fabrication are presented. At first, operating principle of EBL system is overviewed. Then a detailed discussion on key process in EBL is made, such as the choice of Resist, optimized lift-off process and modification of proximity effect. In the final part, several examples on biological medicine and silicon photonics applications are added. The EBL is now attaching increasingly more attention due to its great potentials in the days to come.

关 键 词：电子束光刻 微纳加工 纳米电子器件 

分 类 号：TN305.7[电子电信—物理电子学]