基于宏微驱动的光刻机掩模台控制系统设计  

Design for Control System of Reticle Stage for Lithography Machine Based on Macro-Micro Control Strategy

作　　者：饶裕 刘杨[1] 齐彪[1] 李杨[1] 王岩[1] RAO Yu LIU Yang QI Biao LI Yang WANG Yah(School of Astronautics, Harbin Institute of Technology, Harbin 150001 China)

机构地区：[1]哈尔滨工业大学航天学院,黑龙江哈尔滨150001

出　　处：《自动化技术与应用》2017年第10期61-64,共4页Techniques of Automation and Applications

摘　　要：光刻是集成电路制造环节的一项重要工艺,主要通过光刻机来完成。作为其重要组成部分,掩模台的性能直接决定了能生产的芯片制程和效率,其工作特点对掩模台提出各种要求,例如:大行程、高精度等。本文采用了一种宏微结合的控制方案,即宏动部分实现大行程粗定位,微动实现小行程精定位。并利用PID控制算法配合高精度的传感器在实验室实验这套控制方案。文章介绍了系统构成,宏微控制策略,以及各个环节的实现,并分析了最后的实验结果 ,为今后的掩模台控制系统设计提供参考依据。Lithography is an important process in produce integrated circuits, mainly through lithography machine to realization. As an important part, reticle stage ＇ s performance directly decides the process and production efficiency of chip which can make. Reticle stage ＇ operational features put forward various requirements, such as： long-range; high-precision and so on. This paper proposes a macro-micro control strategy, the macro part achieves long-range but rough position and micro part achieves tiny-range but high-precision. High accuracy sensor and pid control algorithm are used to test this strategy in laboratory. This article introduces system structure, macro-micro control strategy and realization of each part, then analyse experiment result, it can be used as a reference of reticle stage ＇ s design in future.

关 键 词：光刻机 掩模台 PID 运动控制卡 

分 类 号：TP273[自动化与计算机技术—检测技术与自动化装置]