石墨的微加工工艺研究  

Experimental Study on Micro/Nano-Machining of Highly Oriented Pyrolitic Graphite

作　　者：章城 文东辉[1] 杨兴[2] 郑天祥 

机构地区：[1]浙江工业大学特种装备制造与先进加工技术教育部重点实验室,杭州310014 [2]清华大学精密测试技术及仪器国家重点实验室,北京100084 [3]全球能源互联网研究院先进输电技术国家重点实验室,北京102200

出　　处：《真空科学与技术学报》2018年第2期127-131,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家重大科学研究计划(2013CB934200);国家自然科学基金项目(51375263)

摘　　要：石墨具有固态超滑和耐酸、耐碱和耐有机溶剂腐蚀等特性,使其有望成为微机电系统(MEMS)基础材料的一种选择。如能通过微纳米加工工艺对石墨进行微加工并在石墨上大批量、稳定、可控地制备各种掩模图案和石墨微结构,一定程度上可以推动石墨成为MEMS基础材料。故本文通过工艺设计和参数摸索,利用薄膜沉积、光刻、刻蚀等常用的微纳米加工工艺对石墨进行微加工研究,并对加工后的石墨进行表征。结果表明,利用薄膜沉积技术在石墨表面沉积的薄膜可以满足后续光刻和刻蚀等工艺的要求。同时,采用光刻技术能在石墨表面大批量、稳定、可控地加工出不同形状,不同尺寸的光刻胶掩模图案。此外,利用刻蚀技术可以在石墨上大批量、稳定、可控地加工出形状较规则,排列整齐且垂直度较高的石墨微结构。We experimentally addressed the micro/nano-machining of highlyoriented pyrolitic graphite（ HOPG）,an electronic base material with increasing importance for fabrication of microelectromechanical systems（ MEMS） devices,because of its favorable properties,including solid-state super-lubricity and high corrosion-resistance against strong chemicals. The impact of the micro/nano-machining conditions in routine MEMS fabrication,including SiO_2 film deposition,lithography and etching,on the quality and stability of the micro/nano-structures was investigated. The results show that the MEMS fabrication processes work well under the optimized conditions. For example,the high quality SiO_2 films,grown by plasma enhanced chemical vapor deposition on HOPG substrate satisfied well the stringent requirements of lithography and etching. A variety of arrays with well-defined stable micro/nanostructures were regularly fabricated on fairly large scale by conventional lithography and etching. We suggest that the newly-developed micro/nano-machining of graphite be of some technological interest in MEMS device fabrication.

关 键 词：石墨 微机电系统 微纳米技术 薄膜沉积 光刻 刻蚀 

分 类 号：TM242[一般工业技术—材料科学与工程] TB742[电气工程—电工理论与新技术]