走向光学工业应用的辅助镀膜霍尔等离子体源  

The Hall accelerator for assisted deposition in optical industry application

作　　者：尤大伟[1] 李安杰[1] 江建国 武建军[1] 黄小刚[1] 

机构地区：[1]中国科学院空间中心,北京100080 [2]北京市光电研究所,北京100010

出　　处：《核技术》2002年第9期679-683,共5页Nuclear Techniques

摘　　要：论述了霍尔等离子体源的工作原理 ,讨论并测试了该源最佳的磁场及分布。本设计采用永久磁铁并利用极靴产生发散磁场 ,及沿轴向有较大梯度的磁场 。The IAD technology (Ion assisted deposition) attractes more attention recently because of the advantages. The Hall accelerator for IAD was developed. It has small size (  6cm), low energy (average energy 40-150eV), high beam current (200-1000mA), large uniformity (the uniform area >  50cm) and the compact construction. The design of the Hall accelerator and the optimum magnetic structure were presented. The permanent magnet was applied. The pole pieces were arranged to obtain the divergent magnetism and strong magnetism gradient along axial direction. The design gives us good results. The high discharge efficiency and low neutral loss were obtained. The Hall acceralater can work in low pressure 1×10 -2 -2×10 -2 Pa, low flowrates 5-10 SCCM stably.

关 键 词：光学工业 霍尔等离子体源 光学镀膜 离子束辅助镀膜 工作原理 霍尔电流加速器 

分 类 号：TB43[一般工业技术] TL503.3[核科学技术—核技术及应用]