二氯二氢硅综合应用研究进展  

Research progress in comprehensive application of dichlorodihydrosilane

作　　者：付绪光 陈其国[1,2,3] 吕加南 FU Xuguang;CHEN Qiguo;LYU Jia-nan(Jiangsu Zhongneng Polysilicon Technology Development Co.,Ltd.,Xuzhou 221004,China;National & Local Joint Engineering Research Center of Advanced Silicon Materials Preparation Technology,Xuzhou 221000,China;Jiangsu Engineering Research Center For Polysilicon Material,Xuzhou 221004,China)

机构地区：[1]江苏中能硅业科技发展有限公司,江苏徐州221004 [2]先进硅材料制备技术国家地方联合工程研究中心,江苏徐州221000 [3]江苏省多晶硅材料工程技术研究中心,江苏徐州221004

出　　处：《氯碱工业》2019年第5期29-32,共4页Chlor-Alkali Industry

摘　　要：详述了二氯二氢硅与四氯化硅进行反歧化反应制备三氯氢硅技术的研究进展,简述了二氯二氢硅在制备多晶硅、硅烷气、多晶硅薄膜、氮化硅薄膜和二氧化硅薄膜中的应用。The progress in preparation of trichlorosilane by the anti-disproportionation reaction of dichlorodihydrosilane with silicon tetrachloride was described in detail.The applications of dichlorodi?hydrosilicon in the preparation of polysilicon,silane gas,polysilicon film,silicon nitride film and silicon dioxide film were briefly described.

关 键 词：二氯二氢硅 反歧化反应 三氯氢硅 硅烷 多晶硅 氮化硅薄膜 二氧化硅薄膜 

分 类 号：TQ127.2[化学工程—无机化工]