一种面向MEMS矢量水听器的硅纳米线制备方法  

A Preparation Method of Silicon Nanowires for MEMS Vector Hydrophone

作　　者：史一明 齐秉楠 白建新 宋金龙[1] 王卫东 王任鑫[1] SHI Yi-ming;QI Bing-nan;BAI Jian-xin;SONG Jin-long;WANG Wei-dong;WANG Ren-xin(Key Laboratory of Instrumentation Science and Dynamic Measurement(North University of China)

机构地区：[1]中北大学仪器科学与动态测试教育部重点实验室,山西太原030051

出　　处：《中北大学学报（自然科学版）》2020年第5期455-460,共6页Journal of North University of China(Natural Science Edition)

基　　金：国家自然科学基金青年科学基金资助项目(61604134);国防科技重点实验室基金(6142109KF201804);博士后特别资助计划(2017T100171);实验室开放基金(JZ2018036WR)。

摘　　要：为了进一步提高MEMS矢量水听器灵敏度,把硅纳米线作为压敏单元,将硅纳米线工艺引入到MEMS矢量水听器制备过程中,利用其所具有的巨压阻效应来提高MEMS矢量水听器的灵敏度.本文提出了一种自上而下的微加工工艺方法,将TMAH(四甲基氢氧化铵)各向异性腐蚀和干法刻蚀法结合来制备出硅纳米线,其中TMAH腐蚀形成屋檐结构,干法刻蚀形成氧化硅掩模图形以及硅纳米线.该制备方法与半导体工艺相兼容,能够实现与MEMS水声传感器的集成.In order to further improve the sensitivity of MEMS vector hydrophone,we took the silicon nanowire as the pressure-sensitive unit,and introduced the silicon nanowire technology into the preparation process of MEMS vector hydrophone,and improved the sensitivity of MEMS vector hydrophone by using its huge piezoresistive effect.A“top-down”micromachining method-TMAH(tetramethyl ammonium hydroxide)anisotropic corrosion was combined with dry etching to produce silicon nanowires,in which TMAH corrosion formed eaves,dry etching formed silica mask patterns and silicon nanowires.The method is compatible with the semiconductor process and can be integrated with the MEMS underwater acoustic sensor.

关 键 词：MEMS矢量水听器 硅纳米线 自上而下法 TMAH各向异性腐蚀 干法刻蚀 半导体工艺 

分 类 号：TN303[电子电信—物理电子学]