单晶硅窄缝化学机械抛光的控制系统设计  

The Design of Control System for Monocrystalline Silicon Narrow Slot Chemical Mechanical Polishing

作　　者：乔晨翊 王昆[1] QIAO Chen-yi;WANG Kun(College of Mechanical Engineering,Tongji University,Shanghai 201804)

机构地区：[1]同济大学机械与能源工程学院,上海201804

出　　处：《数字技术与应用》2021年第2期10-12,共3页Digital Technology & Application

摘　　要：具有5-10mm窄缝的单晶硅是研究同步辐射光源的重要部件,国内外对于单晶硅窄缝的轨道抛光的研究微乎其微。本文提出了一种单晶硅窄缝化学机械抛光设备的控制系统设计方法。该控制系统以固高运动控制器和C++Builder软件为核心,实现控制伺服电机的旋转运动和水平往复周期性运动,并使用该系统成功加工出了满足表面质量要求的单晶硅窄缝。Monocrystalline silicon with 5-10mm narrow slits is an important component for the study of synchrotron radiation light sources.There is little research on the track polishing of monocrystalline silicon slits at home and abroad.We propose a control system of chemical mechanical polishing equipment for monocrystalline silicon narrow slits.The control system is based on the Gugao Motion Controller and C++Builder software to realize the control of the rotational motion and horizontal reciprocating periodic motion of the servo motor.With this system,the monocrystalline silicon successfully meets the surface quality requirements.

关 键 词：化学机械抛光 同步控制 运动控制卡 

分 类 号：TG58[金属学及工艺—金属切削加工及机床] TN405[电子电信—微电子学与固体电子学]