共价键合光致产酸剂的单分子树脂光刻胶:合成及光刻性能  

Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator

作　　者：张卫杰 陈金平[1] 于天君[1] 曾毅[1,2] 李嫕 ZHANG Weijie;CHEN Jinping;YU Tianjun;ZENG Yi;LI Yi(Key Laboratory of Photochemical Conversion and Optoelectronic Materials,Technical Institute of Physics and Chemistry,Chinese Academy of Sciences,Beijing 100190,P.R.China;University of Chinese Academy of Sciences,Beijing 100049,P.R.China)

机构地区：[1]中国科学院理化技术研究所,光化学转换与功能材料重点实验室,北京100190 [2]中国科学院大学,北京100049

出　　处：《影像科学与光化学》2022年第2期211-219,共9页Imaging Science and Photochemistry

基　　金：国家自然科学基金项目(22090012);国家科技重大专项(2018ZX02102-005)资助。

摘　　要：设计合成了一种共价键合光致产酸剂(PAG)的单分子树脂(molecular glass)材料HPS-MSF,该材料具有良好的热稳定性和成膜性。以该单分子树脂为主体材料,四甲氧基甲基甘脲(TMMGU)为交联剂进行配方,制备得到负型单分子树脂光刻胶。通过254 nm紫外曝光初步研究了光刻胶的配方、后烘及显影条件。进一步利用电子束光刻对该负型光刻胶进行评价,当TMMGU添加量为15%或30%时,在曝光剂量分别为140μC/cm^(2)和110μC/cm^(2)时,均可以得到线宽为150 nm,周期300 nm的光刻条纹。A molecular glass material HPS-MSF covalently bonded with photoacid generator(PAG)was designed and synthesized.It exhibits good thermal stability and film-forming properties.A negative-tone molecular glass photoresist based on HPS-MSF as the main material and 1,3,4,6-tetrakis(methoxymethyl)glycoluril(TMMGU)as the cross-linking agent was prepared.The formulation,post-baking and development conditions of the photoresist were initially studied by 254 nm ultraviolet exposure.The negative-tone photoresist was further evaluated using electron beam lithography.Patterns of a line width of 150 nm in period of 300 nm were obtained at exposure doses of 140μC/cm^(2)and 110μC/cm^(2)for photoresist containing 15%and 30%TMMGU,respectively.

关 键 词：单分子树脂 光刻胶 电子束光刻 光致产酸剂 

分 类 号：TQ320.1[化学工程—合成树脂塑料工业] TN405[电子电信—微电子学与固体电子学]