基于微电铸与键合工艺的纳米尖端电射流打印头的制备  

Fabrication of Nanotip Electrofluidic Printhead Based on Micro-electroforming and Bonding Process

作　　者：辛文文 王华安 朱龙[1] 宿世界 李晓建 梁军生[1,2] Xin Wenwen;Wang Hua'an;Zhu Long;Su Shijie;Li Xiaojian;Liang Junsheng(Key Laboratory for Micro/Nano Technology and System,Liaoning Province//Dalian University of Technology,Dalian,Liaoning 116024,China;Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education//Dalian University of Technology,Dalian,Liaoning 116024,China)

机构地区：[1]辽宁省微纳米技术及系统重点实验室//大连理工大学,辽宁大连116024 [2]精密与特种加工技术教育部重点实验室//大连理工大学,辽宁大连116024

出　　处：《机电工程技术》2022年第10期72-74,94,共4页Mechanical & Electrical Engineering Technology

基　　金：国家自然科学基金资助项目(编号:51675085)。

摘　　要：描述了一种结合微电铸与键合工艺的纳米尖端聚焦电射流打印头的设计及制备方法,并对所制备的打印头进行打印测试。首先通过单晶硅自停止腐蚀工艺制备硅模板,然后通过电铸工艺制备出纳米尖端,最后通过键合及湿法减薄工艺制备出硅-玻璃-纳米镍尖一体化打印头并对纳米打印头进行了打印测试。结果表明,结合微电铸与键合工艺制备的纳米尖端曲率半径可达84.4 nm,使用NOA61(300 mPa·s)紫外固化胶作为打印溶液可打印出平均直径为838 nm的点阵,解决了传统电射流打印百纳米级喷嘴易堵塞及墨水黏度限制在90 mPa·s的问题。A process method for fabricating nano-tip focused electrohydrodynamic jet(NFEJ)printing heads by combining microelectroforming and bonding processes was described,and printing research was carried out on the fabricated printheads.First,a silicon template was prepared by a single crystal silicon self-stop etching process,and then a nano-tip was prepared by an electroforming process,finally,a silicon-glass-nano-nickel tip integrated printing hesd was prepared by bonding and wet thinning process.The printing head was tested for printing.The results show that the radius of curvature of nanotips prepared by combining micro-electroforming and bonding processes can reach 84.4 nm.Using NOA61(300 mPa·s)UV-curable adhesive as the printing solution to print a dot matrix with an average diameter of 838 nm,which solves the problem of traditional electrohydrodynamic jet(E-Jet)printing has the problems that 100-nanometer hollow nozzles are easily blocked and the ink viscosity is limited to 90 mPa·s.

关 键 词：各向异性刻蚀 微电铸 键合 电射流打印 

分 类 号：TN305[电子电信—物理电子学]