基于数字微镜器件的无光罩技术应用  

Application of Maskless Technology Based on Digital Micromirror Device

作　　者：薛瑞 XUE Rui(Applied Materials(Xi'an)Co.,Ltd.,Shaanxi 710119,China.)

机构地区：[1]应用材料(西安)有限公司,西安710075

出　　处：《集成电路应用》2022年第10期20-22,共3页Application of IC

摘　　要：阐述数字微镜技术,基于数字微镜器件的光刻机特性,包括降低掩模成本、减小曝光关键尺寸CD,探讨基于数字微镜器件的光刻机技术应用。This paper describes the digital micromirrortechnology, the characteristics of the lithography machine based on the digital micromirror device, including reducing the mask cost, reducing the key exposure size CD, and discusses the application of the technology of the lithography machine based on the digital micromirror device.

关 键 词：数字微镜器件 掩模板 数字光刻 屏幕编号 

分 类 号：TN405[电子电信—微电子学与固体电子学] TN141