光刻投影物镜畸变检测中的位移测量误差分析  

Displacement measurement analysis in distortion detection of lithography projection objective

作　　者：杜婧[1] 刘俊伯[1] 全海洋[1] 胡松[1] Du Jing;Liu Junbo;Quan Haiyang;Hu Song(State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu,Sichuan 610209,China)

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209

出　　处：《光电工程》2023年第2期88-100,共13页Opto-Electronic Engineering

基　　金：国家重点研发计划(2021YFB3200204);中国科学院青年创新促进会(2021380)。

摘　　要：在光刻投影物镜的畸变检测中,位移测量误差是光刻投影物镜畸变检测的重要误差源之一,深度分析误差源并减小误差项,可提高光刻投影物镜的畸变检测精度。本文将运动台的定位与测量技术相结合,着重分析利用夏克-哈特曼波前传感器对投影物镜进行畸变检测时像质检测台的位移测量误差。并以一套投影物镜像质检测台为例,对其在投影物镜畸变检测中的位移测量误差进行分析,利用该像质检测台对某一投影物镜进行畸变检测,畸变检测结果约80 nm,其中该像质检测台的位移测量误差会给畸变检测结果带来约22 nm的不确定度。In the distortion detection of the lithography projection objective,the displacement measurement error is one of the important error sources.Depth analysis of the error sources and reduction of the error terms can improve the distortion detection accuracy.Combining the positioning and measurement technology of the moving stage,this paper analyzes the displacement measurement error of the image quality detection stage when the Shack-Hartmann wavefront sensor is used to detect the distortion of the projection objective.In this paper,a set of image quality detection platform is taken as an example to analyze the displacement measurement error in the distortion detection of the projection objective,and the image quality detection platform is used to measure the distortion of a projection objective.The distortion detection result is about 80 nm,in which the displacement measurement error of the image quality detection platform will bring about an uncertainty of about 22 nm to the distortion detection result.

关 键 词：畸变检测 波前检测 位移测量 投影物镜 

分 类 号：TN305.7[电子电信—物理电子学]