纳米压印光刻技术在中国半导体领域的应用与挑战  

作　　者：杨志伟 

机构地区：[1]吉林工业职业技术学院智能制造学院,吉林省吉林市132013

出　　处：《中国科技产业》2024年第6期50-53,共4页Science & Technology Industry of China

基　　金：2024年度吉林省教育厅科学研究项目“新型自加热复合纳米压印膜的制备及应用”(JJKH20241130KJ)。

摘　　要：光刻技术作为半导体制造的核心工艺,对提高集成电路(IC)的功能性和复杂性起着至关重要的作用。随着半导体行业对更高分辨率的追求,传统的光刻技术面临着光源波长与成本效益的限制。纳米压印光刻(Nanoimprint lithography,NIL)技术作为一种非传统的光刻方法,以其低成本和高分辨率的优势,为光刻机领域提供了新的发展方向。本文将探讨NIL技术的原理,以及它如何为中国光刻机行业的破局提供技术支持,从而促进产业技术的进步。Lithography technology,the core processes in semiconductor manufacturing,plays a crucial role in improving the functionality and complexity of integrated circuits(ICs).With the pursuit of higher resolution in the semiconductor industry,traditional lithography technology faces limitations in light source wavelength and cost-effectiveness.Nanoimprint lithography(NIL)technology,as a non-traditional lithography method,provides a new development direction for the field of lithography machines due to its advantages of low cost and high resolution.This article will explore the principles of NIL technology and how it can provide technical support for the breakthrough of the Chinese lithography industry,thereby promoting the progress of industrial technology.

关 键 词：纳米压印光刻 光刻机 半导体制造 技术突破 产业进步 

分 类 号：F426.63[经济管理—产业经济] TN305.7[电子电信—物理电子学]