光栅干涉精密纳米测量技术  

Grating interferometric precision nanometric measurement technology

作　　者：李星辉 崔璨 LI Xinghui;CUI Can(Shenzhen International Graduate School,Tsinghua University,Shenzhen 518055,China;Tsinghua-Berkeley Shenzhen Institute,Tsinghua University,Shenzhen 518055,China)

机构地区：[1]清华大学深圳国际研究生院,广东深圳518055 [2]清华大学清华-伯克利深圳学院,广东深圳518055

出　　处：《光学精密工程》2024年第17期2591-2611,共21页Optics and Precision Engineering

基　　金：广东省基础与应用基础研究基金资助项目(No.2021B1515120007);深圳市稳定支持计划项目(No.WDZC20231124201906001);国家自然科学基金资助项目(No.62275142)。

摘　　要：光栅干涉测量是一种重要的精密纳米测量技术,具有高分辨率、高抗干扰能力和多自由度扩展的优势,在先进节点光刻机、超精密机床等场景中发挥着至关重要的作用。对比介绍了光栅干涉、激光干涉与时栅测量技术,明确其应用场景和当前性能参数,阐述了光栅干涉测量中的零差和外差两种技术原理,并在此基础上分析了光栅干涉仪的国内外发展动态,包括代表性的设备厂商,和近年来国内外在纳米及亚纳米精度的单、多自由度系统方面的研究开发情况。进一步地,对光栅干涉测量的精度和误差进行了分析与讨论,介绍了误差来源、分类及针对性的补偿方法。最后,对光栅干涉仪的发展现状及未来前景进行了讨论,期望为光栅干涉仪系统的开发和优化提供参考。Grating interferometry is a crucial technology in precision nanometrology,valued for its high resolution,robustness,and adaptability for multi-axis measurement systems.It is essential in advanced semiconductor manufacturing and ultra-precision machine tools.This review first compares grating interfer⁃ometry with laser interferometry and time grating,detailing their applications and performance.It then ex⁃plains the two main principles:homodyne and heterodyne grating interferometry.The review also analyzes global development trends,highlighting key manufacturers and advancements in achieving nanometric to sub-nanometric precision in single and multi-axis systems.In addition,it examines error sources,classifica⁃tions,and compensation methods in grating interferometry.Finally,it discusses the current state and fu⁃ture prospects of grating interferometers,offering insights for developing and optimizing measurement systems based on this technology.

关 键 词：精密测量 纳米测量 光栅干涉仪 多自由度 误差补偿 

分 类 号：TH744.3[机械工程—光学工程] TN247[机械工程—仪器科学与技术]