ASML公司光学光刻技术最新进展  

Current Progress of Optical Lithography in ASML

作　　者：张强[1] 胡松[1] 姚汉民[1] 刘业异[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微细加工技术》2002年第3期8-11,27,共5页Microfabrication Technology

摘　　要：荷兰ASML公司作为全球三大光刻机集成生产商之一 ,通过不断的技术创新 ,在全球光刻机市场上居于领先地位。在简单介绍光刻机基本工作原理和主要技术指标的基础上 。ASML is one of the three biggest providers of lithography system and has been becoming the leader in global lithography market through continuous technological innovation.The principles and specifications of the optical lithography system are introduced and the latest progress of optical lithography in ASML are analyzed.

关 键 词：ASML公司 光刻机 投影光刻物镜 光学对准 照明系统 双平台扫描 

分 类 号：TN305.7[电子电信—物理电子学]