制作光纤光栅的相移掩模-双光束干涉曝光方法  

A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers

作　　者：冯伯儒[1] 张锦[1,2] 宗德蓉[1] 蒋世磊[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室 [2]四川大学物理系,四川成都610064

出　　处：《光电工程》2003年第1期5-7,共3页Opto-Electronic Engineering

基　　金：国家自然科学基金(60076019#)资助。

摘　　要：介绍将无铬相移掩模技术和双光束干涉曝光技术用于制作纳米级图形光纤光栅的基本原 理和实验系统设计。提出一种用可移动反射镜使写入光束扫描固定在一起的相移掩模和光纤组合体制作光纤光栅的方法,既便于系统调整,增强曝光能量,又可方便制作高分辨力、长尺寸光纤光栅,无论是周期光栅,还是非周期光栅。The basic principle and experimental system design for applying chromeless phase-shifting mask technique and double laser beam interference exposure technique to fabrication nanon-patterns grating in fiber are introduced. A method for fabricating grating in optic fibers is introduced. The method uses a movable mirror to make a direct laser write beam scan across a combination arrangement of phase-shifting mask and optic fibers. It is convenient for system adjustment and intensifying exposure energy, and is convenient for fabricating high-resolution, large size grating (including periodic grating and aperiodic grating) in optic fiber as well.

关 键 词：光纤光栅 相移掩模 双曝光技术 干涉光刻 PSM 微光刻技术 

分 类 号：TN305.7[电子电信—物理电子学]