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作 者:刘谦祥[1] 郭希铭[1] 赵杰[1] 李德军[1]
机构地区:[1]天津师范大学物理与电子信息学院,天津300074
出 处:《天津师范大学学报(自然科学版)》2003年第2期58-61,共4页Journal of Tianjin Normal University:Natural Science Edition
基 金:国家自然科学基金资助项目(10075034);天津市自然科学基金资助项目(023613611)
摘 要:报道了在相同条件下用磁控溅射方法在硅片上制备类金刚石膜和氮化钛薄膜的研究结果,比较了两种镀膜在机械性能和结构上的效果.实验结果表明,氮化钛薄膜虽有很高的表面硬度,但其摩擦系数、表面粗糟度比类金刚石膜要高得多.而类金刚石膜虽有很低的摩擦系数和光滑的表面,但表面硬度比氮化钛薄膜小.因此,结合两种膜的优点有可能制备高硬度、耐磨性强、表面光滑的新型复合材料.In this paper, diamondlike carbon (DLC) and Titanium Nitride (TiN) films on silicon wafer were synthesized by using magnetron sputtering under nearly identical deposition conditions. The structural and mechanical properties of both coatings were compared by means of Raman spectra, Xray diffraction,(XRD), atomic force microscope (AFM) and nanohardness meter. The results indicate that the TiN films inhabit high nanohardness, high friction coefficient and bigger roughness. On the contrary, the DLC films possess lower nanohardness, lower friction and smaller roughness. Therefore, it is possible to make a multilayer structure of DLC/TiN with high nanohardness and high wear resistance.
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