亚稳态氦原子束在纳米结构制作中的应用  

Application of metastable helium atomic beam in nanostructure fabrication

作　　者：陈献忠[1] 姚汉民[1] 陈旭南[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209

出　　处：《强激光与粒子束》2003年第9期919-922,共4页High Power Laser and Particle Beams

基　　金：中科院知识工程创新课题(A2K0009);中科院开放基金资助课题

摘　　要：　介绍两种用亚稳态氦原子束制作纳米结构的新方法。亚稳态原子束从原子源喷出后首先对其进行横向激光冷却,准直后的原子束穿过与之垂直的激光驻波场时发生淬火过程,原子的密度分布出现沟道化效应,给出基于光掩模制作纳米图形的基本原理、理论分析及模拟结果。介绍基于物理掩模制作纳米图形的原理和SAM抗蚀剂,利用沉积在基底上的亚稳态原子破坏基底上的SAM膜,结合刻蚀技术可制作出纳米量级的图形。Two new methods using metastable helium atomic beam to fabricate nanostructures are introduced. A metastable helium atomic beam effusing out of atom source is firstly cooled by transversally in cident laser. This wellcollimated atomic beam traveling through the light standingwave whose direction is perpendicular to atomic beam is quenched, and channeling effect happens in atomic density distribution. In this paper the basic principle of this technique based on mask made of light and theoretical analysis as well as simulation results are given. The principle of another method based on physical mask and SAM(selfassembled monolayers) resists are presented, the SAM on substrate is destroyed by deposited metastable atoms on substrate, and the nanometer-scale structure will be fabricated with etching technologies.

关 键 词：亚稳态原子束 纳米结构制作 光掩模 光驻波淬火 自组装单分子膜抗蚀剂 

分 类 号：TN305[电子电信—物理电子学]