离轴照明空间成像的偏振光影响研究  

An Investigation on Effect of the Polarized Light in the Off-axis Illumination Aerial Images

作　　者：余国彬[1] 罗先刚[1] 姚汉民[1] 严佩英[1] 胡松[1] 严伟[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微细加工技术》2003年第3期22-25,共4页Microfabrication Technology

基　　金：国家自然科学基金资助项目(60078005)

摘　　要：在投影光刻中矢量衍射理论适用于研究照明光的偏振态对空间成像的影响。主要研究了在离轴照明方式下照明光的偏振态对线条图形的影响。发现在高数值孔径时光的偏振状态严重影响了离轴照明空间成像,结果表明可以通过控制照明光的偏振态来改善光学系统的分辨率。Vector diffraction theory is applied for the investigation of the effects of the polarization state of the illumination light on the aerial images in the optical lithography. The effects of the polarization state of the illumination light for the line/space patterns in the offaxis illumination are studied. It is found that aerial images in the off-axis illumination are badly affected by the polarization state of light in the high NA. This result suggests that it is possible to improve the resolution of an optical system by controlling the polarization state of illumination light.

关 键 词：投影光刻 离轴照明 空间成像 偏振光 光学光刻 

分 类 号：TN305.7[电子电信—物理电子学]